X-ray dispersive and reflective structures
US4727000A · kind A · utility
27Cited by
8References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 18, 1986 |
| Grant date | Feb 23, 1988 |
| Priority date | — |
| Expiry date | Jun 18, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
X-ray dispersive and reflective structures and materials are provided which exhibit at least one third of the theoretical integral reflection coefficient for the structures in the range of interest without fluorescence or absorption edges. The materials can be thermally activated to control the desired properties, during or post deposition. The structures can be deposited by ion beam absorption techniques to form the structures in a precise manner. The index of the refraction of the structures can be continuously varying throughout the structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.