Patent · US Expired

Method of producing sheets of crystalline material

US4727047A · kind A · utility

346Cited by
19References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 6, 1981
Grant dateFeb 23, 1988
Priority date
Expiry dateApr 6, 2001

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/977
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method of producing sheets of crystalline material is disclosed, as well as devices employing such sheets. In the method, a growth mask is formed upon a substrate and crystalline material is grown at areas of the substrate exposed through the mask and laterally over the surface of the mask to form a sheet of crystalline material. This sheet is separated, and the substrate can optionally be reused. The method has particular importance in forming sheets of crystalline semiconductor material for use in solid state devices.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.