Plasma generating apparatus using magnets and method
US4727293A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 7, 1986 |
| Grant date | Feb 23, 1988 |
| Priority date | — |
| Expiry date | Apr 7, 2006 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32678
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An improved ion generating apparatus for producing a plasma disk using magnets 34 and 35 around a region 16 in a chamber 15 positioned in a microwave cavity is described. The apparatus is particularly operated at a microwave frequency such that electron cyclotron resonance is produced in the plasma to create an accelerating surface for the electrons around and inside of the plasma. The apparatus can be operated to treat an article 100 in the plasma or a holder 39, with a grid 51 to withdraw particles or with a magnets 47 around an opening 48 forming a nozzle which with electron cyclotron resonance produces a neutral beam of charged particles. The apparatus is particularly useful as a plasma source especially for oxidation, etching and deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.