Patent · US Expired

Integrated circuit architecture and fabrication method therefor

US4727493A · kind A · utility

44Cited by
8References
24Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMay 4, 1984
Grant dateFeb 23, 1988
Priority date
Expiry dateMay 4, 2004

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A new ensemble of logic elements organized in an array and a method of forming the same wherein the architecture includes a main field of transistor elements formed on a substrate material. A group of load transistors and an array of logic gates are formed on the substrate and are located within the main field of transistors. At least one routing channel is provided in the main field, and an input/output structure is located on the substrate. A region of flip-flop elements, also located within the main field, may be provided. Preferably, a plurality of such groups, arrays and regions are formed in parallel strips extending across the main field, and a perpendicular bussing channel also extends across the field to divide the main field into component arrays. The logic gates may be configurable structures or dedicated inverters, and a plurality of input/output structures may be employed. The method includes the electrical interconnection of these elements into logic terms to form an integrated circuit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.