Method of calibrating reflectance measuring devices
US4729657A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 23, 1986 |
| Grant date | Mar 8, 1988 |
| Priority date | — |
| Expiry date | Jun 23, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/4785
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of calibrating reflectance measuring devices, such as spectrophotometers, that incorporate automatic gain or sensitivity setting capability. According to the method, offset reflectance and reflectance of a secondary reflectance standard for several wavelengths are calculated and stored in a memory of a reflectance measuring device. A secondary standard is mounted in the reflectance measuring device and reflectances at a selected wavelengths from the secondary standard are read prior to measurement of the reflectance of the test sample. The stored offset reflectance and secondary reflectance for the operational wavelength are used to calculate true reflectance of the test sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.