Water-resistant photographic paper support
US4731285A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Sep 8, 1986 |
| Grant date | Mar 15, 1988 |
| Priority date | — |
| Expiry date | Sep 8, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31913
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
There is described a water-resistant paper support for photographic purposes with at least one coating which is hardened by electron beams, wherein the resin layer forming the coating contains acrylated or methacrylated phosphoric acid with a ratio of acrylate or methacrylate groups to acid groups of 1:2 to 2:1, or itaconic acid, and wherein this acrylated or methacrylated phosphoric acid or the itaconic acid in the resin mixture forming the coating amounts to 1 to 15 weight %, and preferably 4 to 10 weight %, relative to the entire mixture, and the acrylated or methacrylated phosphoric acid possesses an average molecular weight of 400 to 600.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.