Method of forming a patterned glass layer over the surface of a substrate
US4732838A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 11, 1987 |
| Grant date | Mar 22, 1988 |
| Priority date | — |
| Expiry date | Feb 11, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0047
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Patterned glass layers which are defect-free and have smooth surfaces are formed by a method wherein a mixture of glass frit and a photoresist composition is applied to the surface of the substrate; the layer is photolithographically patterned by exposing and developing predetermined areas of the layer; then after development and prior to firing of the glass frit, the layer of material is subjected to treatment with a suitable plasma at a temperature below the thermal decomposition temperature of the photoresist composition to remove the photoresist composition from the portion of the resist layer remaining on the substrate; and then the remainder of the layer, consisting essentially of glass frit, is fired to form a smooth, defect-free, patterned glass layer over the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.