Patent · US Expired

Irradiation cross-linkable thermostable polymer system, for microelectronic applications

US4732843A · kind A · utility

11Cited by

5References

6Claims

0Family size

Assignee

Siemens Aktiengesellschaft · DE

Inventors

Klaus Budde · Unterhaching, DE
Friedrich Koch
Ferdinand Quella · Munich, DE

Key dates

Filing date	Aug 5, 1985
Grant date	Mar 22, 1988
Priority date	—
Expiry date	Aug 5, 2005

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S525/922
WIPO fieldAudio-visual technology
WIPO sectorElectrical engineering

Abstract

Linear fluorooligomers having at least two reactive end groups per polymer molecule are incorporated into radiation sensitive polymer systems which have improved continuous temperature resistance and low dielectric constant. The polymer systems can be applied as lacquers. Preferably perfluorated poly-ethers and perfluorated alkanes are used as starting compounds. The polymeric product is usable as a coating for the production of printed multi-layer wirings and economises on through-bores and additional copper intermeidate layers. A further field of application exists in the field of integrated semiconductor ciruits in VLSI-technology for the production of negative photo-resists.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.