Pressure-tight vacuum chamber of an electron beam engraving machine for electron beam engraving of printing cylinders for printing technology
US4733046A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 28, 1986 |
| Grant date | Mar 22, 1988 |
| Priority date | — |
| Expiry date | Aug 28, 2006 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41C1/05
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Pressure-tight vacuum chamber of an electron beam engraving machine for the acceptance of printing cylinders to be engraved, comprising a lower part similar to a machine bed, comprising a pressure-tight vacuum hood put in place on said lower part which is fashioned as a barrel-like arch and which is put in place on a sealing lip surrounding said lower part at its upper edge, comprising a loading opening for the printing cylinders situated in the upper central region of said hood and extending in longitudinal direction of said hood, comprising a cover lowerable into the loading opening and sealing with the loading opening, and comprising lifting and coveying devices situated at the face ends and at the loading opening with which the cover can be lifted out of its closed position and can be moved at the outer circumference of the hood in circumferential direction while releasing the opening in open position and can be moved back from the open position over the opening and be lowered into the closed position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.