Patent · US Expired

Sputtering cathode on the magnetron principle

US4734183A · kind A · utility

17Cited by

8References

5Claims

0Family size

Assignee

Leybold-Heraeus GmbH · DE

Inventors

Peter Wirz · Unterkulm, CH
Gudrun Przybilla · Alzenau, DE
Karl-Heinz Schuller · Obertshausen, DE
Bernd Cord · Alzenau, DE

Key dates

Filing date	Aug 15, 1986
Grant date	Mar 29, 1988
Priority date	—
Expiry date	Aug 15, 2006

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3408
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

In a sputtering cathode on the magnetron principle with a target consisting of at least one piece and composed of the material to be sputtered, there is disposed in back of the target a magnet system having a plurality of magnet units of alternately different polarity. These form at least two endless magnetic tunnels of arching lines of force situated one within the other. The poles of the magnet units that face away from the target are joined together by a magnet yoke of soft-magnetic material. To solve the problem of being able to deposit coatings of uniform thickness with only one source of power per cathode, provision is made such that the strength of at least one magnetic field forming a magnetic tunnel can be varied relative to the strength of at least one additional magnetic field forming an additional magnetic tunnel.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.