Semiconductor IC and method of making the same
US4734345A · kind A · utility
14Cited by
2References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 28, 1986 |
| Grant date | Mar 29, 1988 |
| Priority date | — |
| Expiry date | May 28, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H1/04
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for making a semiconductor device involves placing a semiconductor wafer in a position where two coherent light beams can interfere thereon. One of the coherent light beams is modulated by a hologram inserted in the path of the beam projected onto a surface of the semiconductor wafer. The other of the coherent light beams is also projected onto the same surface of the semiconductor wafer. The two interfering light beams form a pattern on a photoresist film found on the surface of the semiconductor wafer, which can be developed by photoresist techniques.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.