Inversely processed resistance heater
US4734563A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Aug 21, 1986 |
| Grant date | Mar 29, 1988 |
| Priority date | — |
| Expiry date | Aug 21, 2006 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J2/3359
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A unique inverse processed film resistance heater structure including a conventional passivation wear layer which is deposited directly on a first substrate. This deposition step is then followed by the deposition and patterning of resistance and conductive layers, and these layers are covered by an isolation layer and a thick support layer. The thick support layer is then bonded to a second substrate and the first substrate is removed so that a uniform, flat passivation layer is exposed. The result is a film resistor which has a reduced failure rate as compared to the prior art because it is covered by a planar passivation wear layer with fewer pin-holes and reduced stress.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.