Method for projecting and exposing a photomask pattern onto re-exposing substrates and its apparatus
US4734745A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 14, 1986 |
| Grant date | Mar 29, 1988 |
| Priority date | — |
| Expiry date | Mar 14, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70641
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and an apparatus for projecting and exposing a photomask pattern of a master mask onto a plurality of re-exposing substrates using first and second pluralities of positioning markers, marked on the master mask and a standard marker substrate, respectively, and a condensing optical system for optically aligning the mounting positions of the master mask and the re-exposing substrate and exposing the photomask pattern onto the re-exposing substrate, where the master mask and the re-exposing substrate are placed at the conjugate points of the condensing optical system. In an embodiment in which the focus length of the condensing optical system is long, the standard marker substrate is fixed in close proximity to the re-exposing substrate on the optical axis of the condensing optical system to produce a shadow image of the second positioning markers on the re-exposing substrate. In a second embodiment, in which the focus length of the condensing optical system may be long or short, the condensing optical system is separated into two condensing optical parts which are optically connected in series at a optically relaying node, and the standard marker substrate is positioned at t…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.