Apparatus for drying substrates
US4735000A · kind A · utility
5Cited by
1References
3Claims
0Family size
Inventors
Key dates
| Filing date | May 7, 1987 |
| Grant date | Apr 5, 1988 |
| Priority date | — |
| Expiry date | May 7, 2007 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF26B5/08
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus for drying substrates by means of centrifugal force. Air is introduced into a drying chamber from the top end thereof. A rotary member is provided in the drying chamber, on which is mounted a cassette in which a plurality of substrates to be dried are stored. An auxiliary chamber is disposed at the bottom part of the drying chamber, within which fan blades are provided. An auxiliary exhausting duct is connected to the auxiliary chamber, whereby fine particles of dust produced around the bearing are completely exhausted.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.