Methods of depositing germanium carbide
US4735699A · kind A · utility
8Cited by
3References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 29, 1986 |
| Grant date | Apr 5, 1988 |
| Priority date | — |
| Expiry date | May 29, 2006 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/0057
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A prior art method of depositing Germanium Carbide involves the use of glow discharge techniques which are problematic in that they require high substrate temperatures. Methods embodying the present invention comprise exposing a target of germanium to a plasma comprising an inert gas and a halocarbon gas. The plasma is maintained by means of a radio frequency magnetron electrode which is associated with the target. Atoms and ions of Germanium and Carbon are sputtered onto the substrate in order to deposit the Germanium Carbide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.