Negative-working photosensitive composition comprising a diphenylamine-melamine condensate and an azide compound
US4737438A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 21, 1986 |
| Grant date | Apr 12, 1988 |
| Priority date | — |
| Expiry date | Oct 21, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/012
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The negative-working photosensitive composition of the invention, which is suitable as a photoresist material in the photolithographic processing of semiconductor devices, comprises (a) a condensation product of a hydroxy-substituted diphenylamine compound such as 4-hydroxy diphenylamine and a methylol melamine or alkoxylated methylol melamine by the reaction in a medium of phosphoric or sulfuric acid and (b) an azide compound capable of strongly absorbing UV or far UV light. The composition gives a photoresist layer having high resistance against heat in the post-baking and the attack of gas plasma encountered in the dry etching for semiconductor processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.