Patent · US Expired

Process for producing micro Fresnel lens

US4737447A · kind A · utility

59Cited by
9References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 9, 1986
Grant dateApr 12, 1988
Priority date
Expiry dateJun 9, 2006

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S430/146
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A process for producing a micro Fresnel lens comprising the following steps: applying a photoresist coat to a smooth-surfaced substrate such as a glass, plastic or metal plate; exposing the resist cost to actinic radiation such as an electron beam, laser beam or UV rays; developing the exposed coat to form a resist pattern duplicating concentric rings for the desired micro Fresnel lens; forming an electrode element on the resist pattern by depositing a conductive metal such as silver or nickel by sputtering or evaporation; forming a nickel layer on the conductive metal electrode element by depositing metallic nickel or a nickel compound through electroforming wherein the pattern of the concentric rings is transferred onto the nickel layer with the conductive metal being used as an electrode; forming a nickel stamper by peeling the nickel layer from both the electrode and the substrate; and forming a micro Fresnel lens on the nickel stamper by either the photopolymerization or injection method of duplication.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.