Patent · US Expired

Process for removal of impurities from a gas

US4738691A · kind A · utility

5Cited by
11References
18Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJan 7, 1987
Grant dateApr 19, 1988
Priority date
Expiry dateJan 7, 2007

Classification

  • Technology area (CPC F)Mechanical Engineering; Lighting; Heating
  • CPC primaryF25B27/00
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A process for removal of organic impurities from a gas mixture is disclosed for removing most of the impurities from the gas mixture in an economical way. The gas to be purified is subjected to two successive purification stages, in which the impurities still remaining in the gas to be purified after the first purification stage are burned in a second purification stage and the released energy thus is used for operating the first purification stage.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.