Electron beam pattern line width measurement system
US4740693A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 11, 1985 |
| Grant date | Apr 26, 1988 |
| Priority date | — |
| Expiry date | Dec 11, 2005 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B15/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed is an electron beam pattern line width measurement system wherein an electron beam is converged to a fine spot, the electron beam is scanned on a sample formed with a pattern to-be-measured, secondary electrons generated from a surface of the sample by the projection of the electron beam are detected, and the detected signal is processed to determine a line width of the pattern to-be-measured, comprising a secondary electron detector which detects a signal corresponding to an amount of all secondary electrons generated by the scanning, and a secondary electron energy analyzer which selectively detects a signal corresponding to an amount of secondary electrons of specified energy. With the electron beam pattern line width measurement system, it becomes possible to precisely detect a pattern boundary region defined by different sorts of materials in a stepped structure of a small level difference not having been measurable with a prior-art electron beam pattern line width measurement system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.