Treatment of wastes from high purity silicon process
US4743344A · kind A · utility
4Cited by
4References
1Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 26, 1986 |
| Grant date | May 10, 1988 |
| Priority date | — |
| Expiry date | Mar 26, 2006 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B33/1071
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Method for treating waste slurries containing solid impurities, e.g. in the form of metal chlorides, and silicon tetrachloride and trichlorosilane by evaporation and separation techniques to recover more of the silicon tetrachloride and trichlorosilane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.