Patent · US Expired

Treatment of wastes from high purity silicon process

US4743344A · kind A · utility

4Cited by
4References
1Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 26, 1986
Grant dateMay 10, 1988
Priority date
Expiry dateMar 26, 2006

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B33/1071
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

Method for treating waste slurries containing solid impurities, e.g. in the form of metal chlorides, and silicon tetrachloride and trichlorosilane by evaporation and separation techniques to recover more of the silicon tetrachloride and trichlorosilane.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.