Electrostatic removal of contaminants
US4744833A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 11, 1987 |
| Grant date | May 17, 1988 |
| Priority date | — |
| Expiry date | Jun 11, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B23/50
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An apparatus and method for electrostatic removal of micron and sub-micron sized contaminant particles is disclosed herein. The apparatus and method comprise creating a potential difference with a megavolt/cm electrostatic field between two conducting bases in a predetermined geometrical relation to each other. An insulator (e.g. a dielectric film) is maintained at or near contact between one of the bases and the surface to be cleaned to electrostatically remove particles from said surface. The bases can be made to move relative to each other and the surface to be cleaned.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.