Anode for magnetic sputtering of gradient films
US4744880A · kind A · utility
17Cited by
5References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 17, 1984 |
| Grant date | May 17, 1988 |
| Priority date | — |
| Expiry date | Oct 17, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3408
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An improved anode system for producing uniform gradient coatings by magnetic sputtering is disclosed, comprising a pair of anode plates asymmetrically designed and positioned along the length of the cathode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.