Ion beam fast parallel scanning having dipole magnetic lens with nonuniform field
US4745281A · kind A · utility
20Cited by
18References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 25, 1986 |
| Grant date | May 17, 1988 |
| Priority date | — |
| Expiry date | Aug 25, 2006 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/147
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion source provides ions that pass through an analyzing magnet, image slit, and magnetic quadrupole lenses before entering a beam deflector. The deflected ion beam enters a magnetic field established by a dipole magnetic lens of rectangular cross section in planes parallel to the beam plane including the scanned ion beam, and having a variable width gap in a plane perpendicular to the beam plane that provides a parallel scanned ion beam. The parallel scanned ion beam enters a slot-shaped acceleration columnn and then scans a target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.