Silver halide photographic material for photomechanical process and reductive processing method using the same
US4746594A · kind A · utility
6Cited by
7References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 2, 1987 |
| Grant date | May 24, 1988 |
| Priority date | — |
| Expiry date | Mar 2, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/162
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A silver halide photographic material for a photomechanical process is disclosed. The material comprises a support having provided thereon at least one light-sensitive silver halide emulsion layer and at least one light-insensitive upper layer disposed on the upper side of the emulsion layer. The light-sensitive upper layer has a greater melting time than the light-sensitive emulsion layer. The emulsion layer contains starch, modified starch and/or macromolecular polysaccharides produced from starch using a microbial fermentation process. The material has greatly improved reduction processability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.