Monolithically integrated WDM demultiplex module and method of manufacture of such module

US4747649A · kind A · utility

Assignee

• Siemens Aktiengesellschaft · DE

Inventors

• Jochen Heinen · Haar, DE
• Hans Mahlein · Unterhaching, DE
• Reinhard Marz · Birkenfeld, DE
• Manfred Plihal · Munich, DE
• Heinrich Schlotterer · Putzbrunn, DE
• Gerhard Winzer · Munich, DE
• Ulrich Wolff · Munich, DE

Key dates

• Filing date: Dec 27, 1985
• Grant date: May 31, 1988
• Expiry date: Dec 27, 2005

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10F30/22
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A monolithically integrated WDM demultiplex module has a film wave guide of InGaAsP fashioned on a substrate, a photodiode of InGaAs being applied to the film wave guide. The photodiode is optically coupled to the film wave guide by a leakage coupling. A wavelength selection element in the form of a grating is provided in the surface of the film wave guide. The module can be manufactured with a single epitaxial step. Structures for increasing the crosstalk attenuation of the module and for a better coupling-in of radiation into the module are provided.