Novel electron beam resist materials
US4751168A · kind A · utility
13Cited by
7References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 15, 1986 |
| Grant date | Jun 14, 1988 |
| Priority date | — |
| Expiry date | Apr 15, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/3154
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Positive acting electron beam resist materials are described. The material comprises a polymer having fundamental units of the general formula ##STR1## in which R.sub.1, R.sub.2 and R.sub.3 independently represent hydrogen or a hydrocarbon group having from 1 to 6 carbon atoms, and R.sub.4 represents an organic residue having from 1 to 20 carbon atoms. The polymer may be used, as the resist material, as it is or by mixing with other type of resin.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.