Process for the partial metallization of substrate surfaces
US4753821A · kind A · utility
26Cited by
7References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 2, 1987 |
| Grant date | Jun 28, 1988 |
| Priority date | — |
| Expiry date | Oct 2, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C5/58
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process suitable for the fully additive technique for the electroless partial metallization of substrate surfaces consists in treating the surface with photosensitive silver(I) compounds (e.g. carboxylic acid salts), partially exposing the silver(I) compounds left behind on the surfaces, if necessary intensifying the exposure effect and/or exchanging the silver produced during the exposure for nobler metals, and detaching the unexposed silver(I) compounds.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.