Transparent electroconductive material and process for preparation thereof
US4758464A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 12, 1986 |
| Grant date | Jul 19, 1988 |
| Priority date | — |
| Expiry date | Sep 12, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31855
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Described is a transparent electroconductive material composed of a transparent synthetic resin substrate and a transparent electroconductive film formed on the resin substrate. At least a surface portion of the resin substrate on which the electroconductive film is formed satisfies a requirement represented by the formula: F x Hv=0.4 wherein F is the mole number (.mu.mole/cm.sup.2) of a basic dye that can react with or adhere to the unit area of the surface of the synthetic resin, and Hv is the Vickers hardness as determined according to JIS Z-2244. The absolute value of the photoelasticity constant of the resin substrate below the glass transition temperature thereof is not larger than 15 Brewsters. A preferred transparent electroconductive material is prepared by coating an active energy ray-curing composition satisfying a requirement represented by the above formula on a surface of the transparent synthetic resin substrate having the above-mentioned absolute value of the photoelasticity constant; curing the composition with active energy rays; and forming a transparent electroconductive film on the coating layer by a low-temperature sputtering method at a temperature lower than…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.