Photosensitive naphthoquinone diazide sulfonyl ester compounds for the fabrication of lithographic plates and photosensitive sheet construction with the compounds
US4758497A · kind A · utility
14Cited by
10References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 17, 1987 |
| Grant date | Jul 19, 1988 |
| Priority date | — |
| Expiry date | Apr 17, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/121
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention features a new series of triazine compounds which are characterized by their ability to generate free radicals upon irradiation in a desired optical region, such that they are useful in the fabrication of lithographic plates having improved exposure speed, development, print-out, and contrast characteristics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.