End station for an ion implantation apparatus
US4759681A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jan 16, 1986 |
| Grant date | Jul 26, 1988 |
| Priority date | — |
| Expiry date | Jan 16, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/137
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An end station for ion implantation apparatus comprising an ion implantation process unit having a wafer holder and capable of implanting ions in wafers in a high vacuum, and a wafer supply-collection unit for the process unit. The wafer supply-collection unit comprises: PA0 (a) a plurality of cassettes being capable of accommodating wafers in a plurality of stages, PA0 (b) devices for lifting and lowering the cassette for delivering or accommodating wafers one by one, PA0 (c) stockers equal in number to the number of cassettes for accommodating wafers in a plurality of stages and for accommodating dummy wafers when required, PA0 (d) devices for lifting and lowering the stocker for accommodating or delivering wafers one by one, PA0 (e) devices extending from the cassette to the ion implantation process station via the stocker and capable of transporting wafers in the direction of reciprocation, and PA0 (f) control devices for controlling the operation of the devices described in (b), (d) and (e) above for collecting the wafer from the desired cassette and replacing in the same original supply cassette at its original position after processing thus, enabling the wafer production lin…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.