Patent · US Expired

Method for measuring impurity concentrations in a liquid and an apparatus therefor

US4761074A · kind A · utility

32Cited by
1References
16Claims
0Family size

Assignees

Inventors

Key dates

Filing dateMar 24, 1987
Grant dateAug 2, 1988
Priority date
Expiry dateMar 24, 2007

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2015/0053
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method and an apparatus for measuring an impurity concentration of a liquid comprises atomizing step for atomizing the objective liquid, e.g. pure water, having a predetermined droplet size distribution, and an evaporating step for evaporating to dryness the droplets so as to generate fine particles. Those particles are fed to a condensation nuclei counter, hereinafter referred to as CNC, which counts the number of fine particles and has a specified sensitivity characteristic curve. Then impurity concentration of the objective liquid can be measured, since the concentration is related to the counted number of the CNC, the distribution of droplet size of the atomizer, and the sensitivity characteristic of the CNC including the particle deposition loss.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.