Method for generating structures in micro-mechanics

US4761210A · kind A · utility

Assignee

• Siemens Aktiengesellschaft · DE

Inventors

• Guenter Ehrler · Holzkirchen, DE
• Heinz Hagen · Neubiberg, DE
• Klaus Becker · Munich, DE

Key dates

• Filing date: Jun 16, 1986
• Grant date: Aug 2, 1988
• Expiry date: Jun 16, 2006

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/308
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method for generating patterned structures on a monolith substrate in micro-mechanics to permit the production of at least two successive structurings with the depths required in micro-mechanics. At least two different, selectively removable etching masks which are etchable by different etching agents are applied in sequence to the substrate. A first structuring or patterning step is then employed after the last etching mask has been generated. A further etching step occurs after the removal of the last etching mask through the use of the etching masks then remaining on the substrate. The removal of additional etching masks and generating further structuring steps are repeated until the number of etching steps that have been carried out is the same as the number of etching masks that had been originally present on the monolith substrate.