Interrupted polysilanes useful as photoresists
US4761464A · kind A · utility
22Cited by
31References
14Claims
0Family size
Inventor
Key dates
| Filing date | Sep 23, 1986 |
| Grant date | Aug 2, 1988 |
| Priority date | — |
| Expiry date | Sep 23, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0757
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Polysilane polymers in which the Si backbone is interrupted by atoms such as O, Ge, Sn, P, etc., are useful photoresists especially in the solvent development mode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.