Low temperature plasma nitridation process and applications of nitride films formed thereby

US4762728A · kind A · utility

Assignee

• FAIRCHILD SEMICONDUCTOR CORPORATION · US

Inventors

• Thomas Keyser · Plymouth, US
• Bruce R. Cairns · Los Altos Hills, US
• Kranti V. Anand · Sunnyvale, US
• William George Petro · San Jose, US
• Michael L. Barry · Palo Alto, US

Key dates

• Filing date: Nov 26, 1985
• Grant date: Aug 9, 1988
• Expiry date: Nov 26, 2005

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/02252
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A silicon nitride layer is prepared on the surface of a silicon substrate by carrying out a surface reaction on the substrate in a vacuum chamber that contains an electrode which is capacitively coupled to an rf generator. A second electrode within the chamber, or a metal wall of the chamber itself, is connected to ground. The silicon substrates to be treated are placed on one of the electrodes to be in electrical and physical contact therewith, and a reagent gas that contains nitrogen is introduced into the chamber. An rf voltage is then applied between the electrodes to ionize and activate the gas, and cause ions and other active species thereof to be directed into the silicon substrate. The nitrogen ions and other active species that are created as a result of the application of the rf power can be directed at the surface of a number of wafers simultaneously. The thin nitride films that are formed by the process have application both as barriers for device isolation and as dielectric components of electrical devices.