Work alignment apparatus for double-sided exposure of a work
US4764791A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 13, 1987 |
| Grant date | Aug 16, 1988 |
| Priority date | — |
| Expiry date | Aug 13, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0082
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a work alignment apparatus for double-sided exposure of a work which serves to convey to and locate the work in an exposing position such that the work is exposed on either side thereof between printing frames each holding an image mask on each corresponding side of the work. The work alignment apparatus comprises means for detecting and calculating an amount of misalignment between the work in the exposing position and each of the image masks, an alignment stage disposed outside the printing frames and adapted to determine a mounting position of the work in an alignment coordinate system in accordance with the misalignment, and means for conveying the work, in the mounting position located in the alignment coordinate system, to the exposing position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.