Anti-reflection layer of silica matrix with fluorinated polylmer particles
US4769306A · kind A · utility
6Cited by
4References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 23, 1987 |
| Grant date | Sep 6, 1988 |
| Priority date | — |
| Expiry date | Sep 23, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31544
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photographic film units are disclosed which incorporate an anti-reflection layer comprising a matrix of silica having dispersed therein particles of a fluorinated polymer. Viewing of the image and/or photoexposure are effected through the anti-reflection layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.