Method for etching materials
US4772365A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Nov 12, 1986 |
| Grant date | Sep 20, 1988 |
| Priority date | — |
| Expiry date | Nov 12, 2006 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23F1/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a method for etching material to be etched, which consists at least partly of metal, an acid is used, which attacks the metal solely after the addition of an oxidizing agent directly before the actual etching operation. The addition of the oxidizing agent takes place in a quantity which slightly exceeds the quantity stoichiometrically necessary for removing the entire metal, so that a small residue of oxidizing agent remains in the etching medium dropping from the material to be etched. This residual oxidizing agent is then removed from the etching medium by a special device, which contains an excess of metal able to be etched by the etching medium.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.