Process for preparing magnetic layer and magnetic head prepared using the same
US4772976A · kind A · utility
20Cited by
5References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 23, 1985 |
| Grant date | Sep 20, 1988 |
| Priority date | — |
| Expiry date | Aug 23, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49034
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Ion implantation is conducted in a desired area(s) of the surface of a magnetic layer, and annealing of the layer is carried out to control the composition in that desired area(s). The control of the composition may be facilitated by applying a one-directional or rotating magnetic field during ion implantation. In preparing a magnetic head, a portion of a magnetic pole at least on one side thereof in close proximity to a magnetic recording medium is formed into an iron or iron-based magnetic alloy film, at least part of which is subjected to ion implantation and annealing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.