Patent · US Expired

Wafer handler

US4773687A · kind A · utility

44Cited by
7References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 22, 1987
Grant dateSep 27, 1988
Priority date
Expiry dateMay 22, 2007

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S414/141
  • WIPO fieldHandling
  • WIPO sectorMechanical engineering

Abstract

A wafer handling technique allows for picking up a wafer from its front side. One or more vacuum ports pull the periphery of the wafer into contact with a ledge raised from a broad surface, providing a friction force that prevents lateral movement of the wafer. A port in the broad surface of the handler flows pressurized gas onto the wafer, thereby preventing contact between the handler and the interior of the wafer. The handler may be sized to be relatively thin, and to cover less than half of the surface of the wafer, thereby allowing for readily loading wafers back-to-back in a furnace boat.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.