Optical scattering free metal oxide films and methods of making the same
US4775203A · kind A · utility
17Cited by
10References
4Claims
0Family size
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Key dates
| Filing date | Feb 13, 1987 |
| Grant date | Oct 4, 1988 |
| Priority date | — |
| Expiry date | Feb 13, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12549
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Optically non-scattering films of titanium dioxide for use in optical elements are prepared by overcoating a non-scattering layer of titanium dioxide with an amorphous layer of silicon dioxide at a temperature which is below the crystallization temperature of the non-scattering film of titanium dioxide. Titanium dioxide and silicon dioxide layers can be deposited by a fusion chemical vapor deposition technique by pyrolytic decomposition of suitable precursors containing the necessary constituents of the respective film layers.
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