RF plasma treated photosensitive lithographic printing plates
US4777109A · kind A · utility
4Cited by
20References
11Claims
0Family size
Inventors
Key dates
| Filing date | May 11, 1987 |
| Grant date | Oct 11, 1988 |
| Priority date | — |
| Expiry date | May 11, 2007 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41N3/032
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A metal base lithographic printing plate cleaned and treated by RF plasma to render the non-exposed area hydrophilic, then coated with either a negative working or positive working photosensitive coating. The method is characterized by its elimination of the conventional alkaline etch with attendant hazard, pollution and toxicity problems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.