Method of manufacturing optical memory element
US4778747A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 24, 1987 |
| Grant date | Oct 18, 1988 |
| Priority date | — |
| Expiry date | Feb 24, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of manufacturing an optical memory element, which includes the steps of applying a first photo-resist layer onto a glass substrate for an optical memory element, laying a mask plate on the glass substrate applied with the first photo-resist layer, with the mask plate being prepared by covering a surface of a transparent substrate with metallic layers formed into a guide pattern configuration, irradiating ultraviolet rays onto the first photo-resist layer through the mask plate, transferring the guide patterns of the mask plate onto the first photo-resist layer, and engraving the guide patterns in the glass substrate by etching after developing the first photo-resist layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.