Non-uniform gas inlet for dry etching apparatus
US4780169A · kind A · utility
562Cited by
5References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 11, 1987 |
| Grant date | Oct 25, 1988 |
| Priority date | — |
| Expiry date | May 11, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A gas inlet having a non-uniform array of inlet holes for the non-uniform introduction of an etching gas into a reaction chamber of a dry etching apparatus. The non-uniform introduction of gas compensates for non-uniform characteristics in the dry etching apparatus resulting in a uniform etch.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.