Method of coating and imaging photopatternable silicone polyamic acid
US4782009A · kind A · utility
23Cited by
4References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 3, 1987 |
| Grant date | Nov 1, 1988 |
| Priority date | — |
| Expiry date | Apr 3, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0276
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Photopatternable silicone polyamic acid can be spun onto a substrate and thereafter used in combination with a photoresist as an antireflective coating or as a patterned silicone polyamide. The silicone polyamic acid can be used with an absorbing dye, or it can be tinted with an organic dye to provide color filters when applied on a transparent substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.