Explosive crystallization in metal/silicon multilayer film
US4783379A · kind A · utility
11Cited by
5References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 17, 1987 |
| Grant date | Nov 8, 1988 |
| Priority date | — |
| Expiry date | Apr 17, 2007 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12674
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention provides a film comprising alternate layers of a metal such as zirconium and silicon. The film has a critical temperature at which the film can undergo explosive crystallization. The film undergoes explosive crystallization upon subjecting the film to an energy impulse at temperature equal to or greater than the critical temperature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.