Patent · US Expired

Method for producing a standard pattern for pattern matching

US4783831A · kind A · utility

10Cited by
6References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 19, 1985
Grant dateNov 8, 1988
Priority date
Expiry dateSep 19, 2005

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06F18/28
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

This invention provides a method and apparatus for automatically producing a standard pattern for local pattern matching. According to the present invention, local patterns equivalent in size to a standard pattern to be obtained are successively removed from the image of an object being examined to prepare standard pattern candidates. Evaluation values representing appropriateness as a standard pattern are obtained from the local patterns successively removed or the local patterns together with the image of the object being examined. The evaluation values are used in an evaluation function expressing the uniqueness of the standard pattern and in an auxiliary evaluation function as an aid to the former. The standard pattern is selected using such evaluation values.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.