Direct-heated flow measuring apparatus
US4783996A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 30, 1986 |
| Grant date | Nov 15, 1988 |
| Priority date | — |
| Expiry date | Jan 30, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F1/6845
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A direct-heated flow measuring apparatus including a substrate, a film resistor for generating heat and sensing its temperature, and a feedback control circuit for controlling the heat generated by the film resistor so that the temperature of the film resistor is a predetermined value. Also, provided in the substrate is an aperture or the like for throttling the heat transfer of the film resistor. Further, a reinforced structure is formed on the part of substrate where the aperture or the like is formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.