X-ray exposure system
US4788698A · kind A · utility
8Cited by
3References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 17, 1987 |
| Grant date | Nov 29, 1988 |
| Priority date | — |
| Expiry date | Mar 17, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70991
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An X-ray exposure system including a plurality of X-ray exposure apparatuses each for duplicating a mask pattern on a semiconductor wafer by irradiating an X-ray mask and the semiconductor wafer with synchrotron radiation is disclosed in which a synchrotron radiation path branching device including a reflecting mirror is disposed between a synchrotron ring and the X-ray exposure apparatuses, and the propagation direction of the synchrotron radiation emitted from the synchrotron ring is changed by the reflecting mirror so that the synchrotron radiation from the ring can be introduced into each of the X-ray exposure apparatuses.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.