Planetary substrate carrier method and apparatus
US4790921A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 6, 1986 |
| Grant date | Dec 13, 1988 |
| Priority date | — |
| Expiry date | Feb 6, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/139
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An inexpensive, vertically oriented multiple substrate carrier is disclosed for high-temperature, high vacuum film deposition systems. In one embodiment, the substrates have central circular openings and the carrier includes a plurality of supports on which the substrates hang, with each support, such as a vertically oriented sheave, engaging the perimeter of a substrate opening. As the carrier is rotated, planetary motion is imparted to the substrates to facilitate simultaneous, two-sided, substantially uniform deposition of a film. In another embodiment, the substrates are circular and are each supported for planetary motion and two sided deposition in a respective circular groove which bounds an opening through the carrier.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.