Fabrication method and equipment for diffraction gratings
US4792197A · kind A · utility
24Cited by
3References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 18, 1986 |
| Grant date | Dec 20, 1988 |
| Priority date | — |
| Expiry date | Jul 18, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S359/90
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and equipment for fabricating two diffraction gratings having the same period but phases that are shifted by .lambda./4 on a work to be treated. A laser beam is divided into two light beams and one of the beams is delayed over a portion of the light beam. The divided light beams are then mixed together so that they interfere. Using the known photolithography technology, the interference patterns are formed into diffraction gratings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.